发明名称 PLASMA LIGHT SOURCE SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma light source which is capable of significantly enhancing output of plasma light to be generated and is capable of prolonging a device life by suppressing a thermal load and electrode wear. <P>SOLUTION: A plasma light source system comprises: a plurality of plasma light sources 10 for periodically emitting plasma light 8 at predetermined light emitting points 1a; and a light-focusing device 40 for focusing the plasma light at the plurality of light emitting points of the plasma light sources, on a single focal point 9. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012212942(A) 申请公布日期 2012.11.01
申请号 JP20120167068 申请日期 2012.07.27
申请人 IHI CORP 发明人 KUWABARA HAJIME
分类号 H01L21/027;H05G2/00 主分类号 H01L21/027
代理机构 代理人
主权项
地址