| 摘要 |
PURPOSE: A coating apparatus, a coating method, and a storage medium are provided to reduce processing time and quantity by not moving a substrate for a heating process after a coating layer is formed. CONSTITUTION: A spin chuck(21) horizontally holds a wafer(W) by vacuum absorption. A guide ring(23) is installed outside the spin chuck to guide a liquid discharge. An air supply port(14) and a fan filter unit(15) are installed on the upper side of a housing(11). A first exhaust port(16) is installed in the housing. A second exhaust port(26) is installed in the inner region of the lower side of a cup(24). [Reference numerals] (30) Lighting controller; (6) Control unit; (AA) Water supply; (BB) Drainage; (CC) Water supply; (DD) Drainage |
