发明名称 Electronic device including doped regions between channel and drain regions and a process of forming the same
摘要 An electronic device can include a drain region of a transistor, wherein the drain region has a first conductivity type. The electronic device can also include a channel region of the transistor, wherein the channel region has a second conductivity type opposite the first conductivity type. The electronic device can further include a first doped region having the first conductivity type, wherein the first doped region extends from the drain region towards the channel region. The electronic device can still further include a second doped region having the first conductivity type, wherein the second doped region is disposed between the first doped region and the channel region.
申请公布号 US8298886(B2) 申请公布日期 2012.10.30
申请号 US20100702025 申请日期 2010.02.08
申请人 LOECHELT GARY H.;GRIVNA GORDON M.;SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 LOECHELT GARY H.;GRIVNA GORDON M.
分类号 H01L21/337 主分类号 H01L21/337
代理机构 代理人
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