发明名称 |
Interference systems for microlithographic projection exposure systems |
摘要 |
An optical system of a microlithographic projection exposure apparatus permits comparatively flexible and fast influencing of the intensity distribution and/or the polarization state. The optical system includes at least one layer system that is at least one-side bounded by a lens or a mirror. The layer system is an interference layer system of several layers and has at least one liquid or gaseous layer portion with a maximum thickness of one micrometer (μm), and a manipulator for manipulation of the thickness profile of the layer portion. |
申请公布号 |
US8294991(B2) |
申请公布日期 |
2012.10.23 |
申请号 |
US20100687299 |
申请日期 |
2010.01.14 |
申请人 |
MUELLER RALF;GRUNER TORALF;TOTZECK MICHAEL;FELDMANN HEIKO;PAUL HANS-JOCHEN;CARL ZEISS SMT GMBH |
发明人 |
MUELLER RALF;GRUNER TORALF;TOTZECK MICHAEL;FELDMANN HEIKO;PAUL HANS-JOCHEN |
分类号 |
G02B27/00 |
主分类号 |
G02B27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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