发明名称 METHOD FOR SLICING WAFER FROM WORKPIECE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for slicing a wafer from a workpiece. <P>SOLUTION: The method for slicing the wafer from the workpiece (12) includes a step of forming the wafer by moving a wire section of a wire of a wire saw disposed in parallel to the workpiece during cutting, the wire section being tightly stretched between two wire guide rolls (1) provided with grooved coating (8) having a specific thickness. The method further includes a step of measuring a change of a coating length of one wire guide roll caused by a temperature change by measuring a distance between a sensor (7) and a ring (9), using the ring secured to the coating at an end of the coating; and a step of cooling the wire guide roll according to the measured distance. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012200859(A) 申请公布日期 2012.10.22
申请号 JP20120058604 申请日期 2012.03.15
申请人 SILTRONIC AG 发明人 HUBER ANTON;GMACH WOLFGANG;KREUZEDER ROBERT;WIESNER PETER
分类号 B24B27/06;B28D5/04;H01L21/304 主分类号 B24B27/06
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