METHOD OF MAKING RADIATION-SENSITIVE SOL-GEL MATERIALS
摘要
Radiation-sensitive sol-gel compositions are provided, along with methods of forming microelectronic structures and the structures thus formed. The compositions comprise a sol-gel compound and a base generator dispersed or dissolved in a solvent system. The sol-gel compound comprises recurring monomeric units comprising silicon with crosslinkable moieties bonded to the silicon. Upon exposure to radiation, the base generator generates a strong base, which crosslinks the sol-gel compound in the compositions to yield a crosslinked layer that is insoluble in developers or solvents. The unexposed portions of the layer can be removed to yield a patterned sol-gel layer. The invention can be used to form patterns from sol-gel materials comprising features having feature sizes of less than about 1 m.
申请公布号
WO2012142126(A2)
申请公布日期
2012.10.18
申请号
WO2012US33073
申请日期
2012.04.11
申请人
BREWER SCIENCE INC.;LIN, QIN;WANG, YUBAO;FLAIM, TONY D.