| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an ion implanter which can prevent particles generated from an ion source from being mixed into a substrate by a simple and inexpensive device configuration. <P>SOLUTION: An ion implanter IM comprises an ion source 1 which draws an ion beam 2 to a direction intersecting the gravity direction G through an ion beam outlet 14, a conveyance tray 7 on which a substrate 4 is mounted, a mask 5 having at least one aperture 6 and being attached to the conveyance tray 7, and a drive mechanism which makes a predetermined region of the substrate to be irradiated with the ion beam 2 through the aperture 6 formed in the mask 5 by moving the conveyance tray 7 in a direction intersecting the ion beam 2. And when viewing the ion beam outlet 14 along the gravity direction G, a dust-proof plate 11 is provided to cover the lower surface of the ion beam outlet 14 without interfering with irradiation of the ion beam 2 to the substrate 4. <P>COPYRIGHT: (C)2013,JPO&INPIT |
