| 摘要 |
A process for producing a silicon film, comprising applying a composition containing a silane compound represented by a compositional formula SinRm (wherein R's independently represent a hydrogen atom, a linear saturated hydrocarbon group having 1 to 20 carbon atoms inclusive, a branched saturated hydrocarbon group having 3 to 20 carbon atoms inclusive, a cyclic saturated hydrocarbon group having 3 to 10 carbon atoms inclusive, an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, a hydroxyl group or a halogen atom; n represents an integer of 3 to 10000 inclusive; and m represents an integer of n to (2n+2)) on a substrate to form a film-like material and irradiating the film-like material with pulsed light to convert the film-like material into a silicon film.
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