| 摘要 |
[Problem] To provide an upper surface antireflective film forming composition, having film formability, a refractive index, temporal stability, and safety all equal to or better than conventional products, and a pattern forming method using the same. [Solution] The upper surface antireflective film forming composition is characterized by comprising: a fluorine containing polymer having a weight-average molecular weight of 300,000-800,000, said polymer being represented by general formula (1): -Ax-By- (1) (where A is a repeating unit represented by general formula (A): (where R is a fluorine containing alkylene group with a carbon number of 1-40, or a fluorine containing alkylene group which has an ether linkage and has a carbon number of 2-100); B is a repeating unit with which it is possible to form a copolymer by bonding with A; x and y are numbers representing polymerization ratios; x is not 0; and A and B may randomly be bonded, or form blocks); an alkyl sulfonic acid with a carbon number of 10-18; and a solvent. |
