发明名称 |
Polishing liquid composition for magnetic disk substrate |
摘要 |
The present invention provides a polishing composition for a magnetic disk substrate that can reduce scratches and surface roughness of a polished substrate without impairing the productivity, and a method for manufacturing a magnetic disk substrate using the polishing composition. The polishing composition for a magnetic disk substrate includes colloidal silica having a &Dgr; CV value of 0 to 10% and water. The &Dgr; CV value is a difference (&Dgr; CV=CV30−CV90) between a value (CV30) obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 30° according to a dynamic light scattering method by an average particle size based on the scattering intensity distribution and multiplying the result by 100 and a value (CV90) obtained by dividing a standard deviation based on a scattering intensity distribution at a detection angle of 90° according to the dynamic light scattering method by an average particle size based on the scattering intensity distribution and multiplying the result by 100. |
申请公布号 |
GB2477067(B) |
申请公布日期 |
2012.10.17 |
申请号 |
GB20110008173 |
申请日期 |
2009.11.04 |
申请人 |
KAO CORPORATION |
发明人 |
YOSHIAKI OSHIMA;TAKESHI HAMAGUCHI;KANJI SATO;NORIHITO YAMAGUCHI;HARUHIKO DOI |
分类号 |
C09K3/14;B24B37/04;C09G1/02 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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