发明名称 |
Methods for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus |
摘要 |
Methods for monitoring meniscus processing of a wafer surface to stabilize a meniscus are provided. In one example, the processing is in response to a current recipe that defines a desired gap between the wafer surface and a proximity head. The method includes the operations of monitoring current meniscus processing to determine that a current gap is other than the desired gap, and identifying a calibration recipe that specifies the current gap. The method then continues the meniscus processing of the wafer surface using process parameters specified by the identified calibration recipe.
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申请公布号 |
US8287656(B2) |
申请公布日期 |
2012.10.16 |
申请号 |
US201113241122 |
申请日期 |
2011.09.22 |
申请人 |
PENG G. GRANT;PADURARU CRISTIAN;MIKHAYLICH KATRINA;LAM RESEARCH CORPORATION |
发明人 |
PENG G. GRANT;PADURARU CRISTIAN;MIKHAYLICH KATRINA |
分类号 |
B08B3/04 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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