发明名称 Methods and apparatuses for roll-on coating.
摘要 Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.
申请公布号 US2012258262(A1) 申请公布日期 2012.10.11
申请号 US201113081504 申请日期 2011.04.07
申请人 REBSTOCK LUTZ;WOLKE KLAUS CONRAD;DYNAMIC MICRO SYSTEMS, SEMICONDUCTOR EQUIPMENT GMBH 发明人 REBSTOCK LUTZ;WOLKE KLAUS CONRAD
分类号 C23C14/28;B05D1/28;B05D3/02 主分类号 C23C14/28
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