发明名称 Method for forming tco films and thin film stack
摘要 <p>A method for controlling surface morphology of a transparent conductive oxide film (TCO, 104) is provided. A substrate (101) is provided as a basis for forming a solar cell. Onto the substrate (101), a seed layer (103) is deposited. Then, the method includes depositing the transparent conductive oxide film (TCO, 104) above the seed layer 103. The seed layer 103 is adapted to control the surface morphology of the transparent conductive oxide film (104). The surface of the transparent conductive oxide film (104) is etched in order to provide a front contact of the solar cell.</p>
申请公布号 EP2509118(A1) 申请公布日期 2012.10.10
申请号 EP20110161202 申请日期 2011.04.05
申请人 APPLIED MATERIALS, INC. 发明人 SCHMIDT, URSULA INGEBORG;SOMMER, ELISABETH;VERMEIR, INGE;KRESS, MARKUS;KUHR, NIELS;OBERMEYER, PHILIPP;SEVERIN, DANIEL;SUPRITZ, ANTON
分类号 H01L31/18;H01L31/0224;H01L31/0236 主分类号 H01L31/18
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