发明名称 METHOD FOR THE LIGHT-INDUCED, GALVANIC PULSED DEPOSITION FOR FORMING A SEED LAYER FOR A METAL CONTACT OF A SOLAR CELL AND FOR THE SUBSEQUENT REINFORCEMENT OF SAID SEED LAYER OR SAID METAL CONTACT AND ARRANGEMENT FOR CARRYING OUT THE METHOD
摘要 <p>The present invention relates to a light-induced, galvanic deposition method, wherein the potential difference between a first metal contact and an auxiliary electrode is varied as a function of time according to a predefined voltage/time characteristic and a light radiation on a solar cell is varied as a function of time according to a light radiation/time characteristic.</p>
申请公布号 KR20120110101(A) 申请公布日期 2012.10.09
申请号 KR20127013037 申请日期 2010.10.22
申请人 ALBERT-LUDWIGS-UNIVERSITAT FREIBURG;FRAUNHOFER-GESELLSCHAFT ZUR FORDERUNG DER ANGEWANDTEN FORSCHUNG E. V. 发明人 RADTKE VALENTIN;BAY NORBERT;ALEMAN MONICA
分类号 C25D5/02;C25D5/18;H01L21/288;H01L31/0224 主分类号 C25D5/02
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