发明名称 |
Apparatus including heating source reflective filter for pyrometry |
摘要 |
Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer. |
申请公布号 |
US8283607(B2) |
申请公布日期 |
2012.10.09 |
申请号 |
US20080100179 |
申请日期 |
2008.04.09 |
申请人 |
RANISH JOSEPH M.;HUNTER AARON M.;KOELMEL BLAKE R.;APPLIED MATERIALS, INC. |
发明人 |
RANISH JOSEPH M.;HUNTER AARON M.;KOELMEL BLAKE R. |
分类号 |
H05B3/68;C23C16/00;F26B19/00;F27B5/14 |
主分类号 |
H05B3/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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