| 发明名称 |
ILLUMINATION SYSTEM AND PROJECTION OBJECTIVE OF A MASK INSPECTION APPARATUS |
| 摘要 |
An illumination system and a projection objective of a mask inspection apparatus are provided. During operation of the mask inspection apparatus, the illumination system illuminates a mask with an illumination bundle of rays having a centroid ray that has a direction dependent on the location of the incidence of the illumination bundle of rays on the mask. |
| 申请公布号 |
KR20120109635(A) |
申请公布日期 |
2012.10.08 |
| 申请号 |
KR20127021711 |
申请日期 |
2011.02.15 |
| 申请人 |
CARL ZEISS SMT GMBH |
发明人 |
FELDMANN HEIKO;SOHMEN ERIK MATTHIAS;STUHLER JOACHIM;GROMER OSWALD;MULLER ULRICH;LAYH MICHAEL;SCHWAB MARKUS |
| 分类号 |
G03F1/00;G01N21/00;G03F1/44;G03F1/84;G03F7/20 |
主分类号 |
G03F1/00 |
| 代理机构 |
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