| 摘要 |
<p>The purpose of the invention is to perform sufficient film forming at the peripheral parts of an optical surface regardless of the position on a support plate. As the aperture angle (?) of an aperture (21) on the first optical surface (OL1) side of a substrate (20), which is a retaining body, is set in the range of 90°=?=120°, and at all positions of substrates (20) affixed to second support body portions (34) and the like, an antireflection film having sufficient film thickness even on the peripheral parts of the first optical surface (OL1) can be formed. Further, in a second area (A2) close to a rotational axis (OX), the aperture (21) on the first optical surface side (OL1) of the substrate is shaped such that an aperture angle element (?1) close to the rotational axis (OX) is larger than an aperture angle element (?2) away from the rotational axis (OX), so the tendency of film thickness being thinner on the rotational axis (OX) side is suppressed, film forming with comparatively uniform film thickness becomes possible at the peripheral parts of the first optical surface (OL1), and coma aberration of the resulting objective lens is prevented.</p> |
