CHEMICAL MECHANICAL POLISHING OF GROUP III-NITRIDE SURFACES

摘要

A method of chemically-mechanically polishing a substrate having a Group Ill-nitride surface includes providing a chemical-mechanical polishing slurry composition. The slurry composition includes a slurry solution including a liquid carrier and an oxidizer including a transition metal or a per-based compound. The slurry solution includes at least one component that reacts with the Group Ill-nitride surface to form a softened Group Ill-nitride surface. The Group Ill-nitride comprising surface is contacted with the slurry composition by a pad to form the softened Group Ill-nitride surface. The pad is moved relative to the softened Group Ill-nitride surface, wherein at least a portion of the softened Group Ill-nitride surface is removed.