| 摘要 |
The present invention is to lessen work burden on a user, to eliminate determination error, to prevent a substrate from being damaged, and to prevent prolonged working time by automatically determining whether or not a particle to be removed is present. A particle inspection and removal apparatus of the present invention includes a particle information acquisition section acquiring particle information on a particle adhering onto a substrate surface, a particle removal section removing the particle adhering onto the substrate surface, a comparison section comparing a threshold set for each of regions of the substrate surface with the particle information on each of the region obtained by the particle information acquisition section, and a particle removal control section controlling the particle removal section to remove the particle on the substrate surface based on a comparison result of the comparison section. |
