发明名称 |
METHOD FOR DUPLICATING PATTERN ON CYLINDRICAL MOLD USING UV IMPRINT TECHNIQUE |
摘要 |
The present invention relates to a method for duplicating a pattern on a cylindrical mold using a UV imprint technique, and more specifically, to a method for duplicating a pattern on a cylindrical mold using a UV imprint technique, which enables the generation of a nano-unit pattern through a simple process, by duplicating a pattern using a UV imprint technique on a cylindrical mold. The method for duplicating a pattern on a cylindrical mold using a UV imprint technique comprises: a first step for coating a UV hardener on the pattern of an original mold, for a stamp cylinder to duplicate the pattern of the original mold while rotating in contact with the original mold, and for irradiating a UV light source on the stamp cylinder; a second step for etching the stamp cylinder duplicated with the pattern of the original mold; a third step for coating the UV hardener on the pattern of the stamp cylinder, for a duplicate mold to duplicate the pattern of the stamp cylinder while rotating in contact with the stamp cylinder, and for irradiating a UV light source on the duplicate mold and duplicating the pattern of the stamp cylinder on the duplicate mold; and a fourth step for etching the duplicate mold duplicated with the pattern of the stamp cylinder. |
申请公布号 |
WO2012128482(A2) |
申请公布日期 |
2012.09.27 |
申请号 |
WO2012KR01468 |
申请日期 |
2012.02.27 |
申请人 |
NEW OPTICS LTD.;SHIN, MYUNGDONG;KIIM, YUSUNG;HUR, JIWON;JUNG, SANGHYO |
发明人 |
SHIN, MYUNGDONG;KIIM, YUSUNG;HUR, JIWON;JUNG, SANGHYO |
分类号 |
B41C3/00;B29C59/02 |
主分类号 |
B41C3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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