发明名称 SILICA FILM AND METHOD FOR PRODUCING SAME
摘要 <p>[Problem] To obtain a silica film with excellent defogging performance, high hardness and high adhesion. [Solution] The present invention pertains to a silica film having pencil hardness of 3H or more measured in accordance with JIS K5600-5-4, and is obtained by dispersing a hydrophobic region having Si-Ch3 bonds in a hydrophilic region of a porous film surface comprising fine pores classified as micropores in the IUPAC classification and having an average diameter of not more than 2nm according to BET measurements.</p>
申请公布号 WO2012127551(A1) 申请公布日期 2012.09.27
申请号 WO2011JP07112 申请日期 2011.12.20
申请人 SHINSHU UNIVERSITY;MURAKAMI, YASUSHI;SHIMIZU, WATARU;HOKKA, JUNSUKE 发明人 MURAKAMI, YASUSHI;SHIMIZU, WATARU;HOKKA, JUNSUKE
分类号 C01B33/12;B05D7/24 主分类号 C01B33/12
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