发明名称 |
Mask blank and method of manufacturing an imprint mold |
摘要 |
Provided is a method of manufacturing an imprint mold formed with a highly accurate fine pattern by the use of a mask blank. In a mask blank having a thin film for forming a pattern on a transparent substrate, the thin film comprises an upper layer formed of a material containing Cr and nitrogen and a lower layer formed of a material containing a compound mainly composed of Ta and capable of being etched by dry etching using a chlorine-based gas. The upper layer and the lower layer of the thin film are etched by dry etching using a chlorine-based gas substantially free of oxygen and then the substrate is etched by dry etching using a fluorine-based gas, thereby obtaining an imprint mold. |
申请公布号 |
US8273505(B2) |
申请公布日期 |
2012.09.25 |
申请号 |
US20080680355 |
申请日期 |
2008.09.26 |
申请人 |
SATO TAKASHI;KUREISHI MITSUHIRO;HOYA CORPORATION |
发明人 |
SATO TAKASHI;KUREISHI MITSUHIRO |
分类号 |
G03F1/22;B29C33/38;B29C59/02;B81C99/00;G03F1/50;G03F1/54;G03F1/68;G03F1/80;H01L21/027 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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