| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase the throughput of a lithographic apparatus. <P>SOLUTION: A lithographic apparatus comprises: an illumination system for providing a radiation beam; a support structure for supporting a patterning device for serving to impart the radiation beam with a pattern in its cross-section; a substrate table for holding a substrate; and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The projection system includes a moveable lens connected to an actuator which is configured to move the moveable lens during projection of the patterned radiation beam onto the target portion of the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
