| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus for forming a carbon film of an even thickness on a three-dimensional object, and to provide a method for forming the carbon film, and the carbon film. <P>SOLUTION: The apparatus 1 for forming the carbon film on a surface of a workpiece W by a plasma CVD method includes: a vacuum tank 10; a first electrode 2 for holding the workpiece; a second electrode 3 disposed at a position spaced apart from the first electrode 2 having erected portions 31 erected around the outer periphery of the first electrode 2, and ionizing raw material gas; power source devices 25 and 35 independently supplying electric power to the first electrode 2 and the second electrode 3, respectively; and a nozzle 42 for supplying the raw material gas. <P>COPYRIGHT: (C)2012,JPO&INPIT |
