发明名称 ELECTROSTATIC CLAMP APPARATUS AND LITHOGRAPHIC APPARATUS
摘要 <p>Disclosed is an electrostatic clamp apparatus ( 500 ) constructed to support a patterning device ( 505 ) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes ( 525 ) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors ( 660 ) operable to measure the shape of said patterning device.</p>
申请公布号 WO2012123144(A1) 申请公布日期 2012.09.20
申请号 WO2012EP50727 申请日期 2012.01.18
申请人 ASML NETHERLANDS B.V.;BANINE, VADIM;LOOPSTRA, ERIK;CADEE, THEODORUS;AKKERMANS, JOHANNES;SCACCABAROZZI, LUIGI;VALENTIN, CHRISTIAAN, LOUIS 发明人 BANINE, VADIM;LOOPSTRA, ERIK;CADEE, THEODORUS;AKKERMANS, JOHANNES;SCACCABAROZZI, LUIGI;VALENTIN, CHRISTIAAN, LOUIS
分类号 G03F7/20 主分类号 G03F7/20
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