发明名称 CHEMICALLY RESISTIVE AND LUBRICATED OVERCOAT
摘要 Embodiments provide novel imaging members used in electrostatography. More particularly, there is provided flexible electrophotographic imaging members which exhibit an extended functional life. These imaging members include an improved protective overcoat layer comprising: (1) a polymer blend of a low surface energy copolymer and a chemically resistive copolymer, (2) a chemically resistive copolymer and a slip agent, and (3) a chemically resistive copolymer and the dispersion of a low surface energy Polyhedral Oligomeric Silsesquioxane (POSS) nanoparticles to effect surface contact friction reduction for enhancing wear resistance and for suppressing copy printout defect caused by chemical attack.
申请公布号 US2012237862(A1) 申请公布日期 2012.09.20
申请号 US201113051951 申请日期 2011.03.18
申请人 YU ROBERT C. U.;XEROX CORPORATION 发明人 YU ROBERT C. U.
分类号 G03G15/00 主分类号 G03G15/00
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