发明名称 FLOATING SUBSTRATE TRANSFERING METHOD AND FLOATING SUBSTRATE TRANSFERING APPARATUS AND SUBSTRATE PROCESSING APPARATUS
摘要 <p>PURPOSE: A floating substrate returning method, a floating substrate returning device thereof, and a substrate processing device thereof are provided to optimize a floating height of a substrate for a floating stage by controlling on-off or sequentially changing the jet pressure of high-tension gas. CONSTITUTION: A floating surface of a floating stage(10) is divided into plural floating areas. The floating stage divides floating surfaces of an incoming area(MIN) and an outgoing area(MOUT) extended to the front and the rear of an application area(MCT) into plural floating areas. Plural outlets(12) are placed on the floating surface. A jet pressure control unit independently changes the jet pressure of high-tension gas of each floating area and performs on-off control.</p>
申请公布号 KR20120103487(A) 申请公布日期 2012.09.19
申请号 KR20120023861 申请日期 2012.03.08
申请人 TOKYO ELECTRON LIMITED 发明人 INAMASU TOSHIFUMI;MIYAZAKI FUMIHIRO
分类号 H01L21/677;B65G49/06;B65G51/03;H01L21/027 主分类号 H01L21/677
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