发明名称 END FACE EMISSION TYPE SEMICONDUCTOR LASER ELEMENT
摘要 <p>This end face emission type semiconductor laser element is provided with a two-dimensional photonic crystal (4) formed in a semiconductor layer. The direction of length (X axis) is made one direction of an electrode (8) contact region. When a direction perpendicular to both this direction of length and the direction of thickness of a substrate is made the direction of width (Y axis), the two-dimensional photonic crystal (4), when viewed from the direction perpendicular to the substrate (Z axis), is positioned within a region which is wider in the direction of width than the contact region that includes the contact region for the electrode, and a structure in which the period of the index of refraction changes periodically while each space along the one direction (X axis) satisfies the conditions for Bragg diffraction is provided.</p>
申请公布号 WO2012121083(A1) 申请公布日期 2012.09.13
申请号 WO2012JP55118 申请日期 2012.02.29
申请人 KYOTO UNIVERSITY;HAMAMATSU PHOTONICS K.K.;WATANABE AKIYOSHI;HIROSE KAZUYOSHI;SHIBATA KOUSUKE;SUGIYAMA TAKAHIRO;KUROSAKA YOSHITAKA;NODA SUSUMU 发明人 WATANABE AKIYOSHI;HIROSE KAZUYOSHI;SHIBATA KOUSUKE;SUGIYAMA TAKAHIRO;KUROSAKA YOSHITAKA;NODA SUSUMU
分类号 H01S5/22;H01S5/12 主分类号 H01S5/22
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