发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To obtain a semiconductor device which easily and securely reduces connection resistance, a connection distance, and the number of connection points between the electrodes and achieves adequate thickness reduction while shortening the processes. <P>SOLUTION: A sealing layer 20 where a connection conductive film 24 is formed on its surface is contacted so that the connection conductive film 24 contacts with electrodes 10a to 10d of a compound semiconductor element 10 provided on a lead frame 11, each lead 11a to 11c, and the lead frame 11. The electrodes 10a to 10d are electrically connected with the respective leads 11a to 11c and the lead frame 11 by the connection conductive film 24, and the compound semiconductor element 10 is sealed by the sealing layer 20. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012178448(A) 申请公布日期 2012.09.13
申请号 JP20110040464 申请日期 2011.02.25
申请人 FUJITSU LTD 发明人 SAKAI TAIJI;TSUNENOBU KAZUKIYO;IMADA TADAHIRO;IMAIZUMI NOBUHIRO;OKAMOTO KEISHIRO
分类号 H01L21/60;H01L21/56 主分类号 H01L21/60
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