METHOD FOR OBSERVING SURFACE CHARACTERISTIC, METHOD FOR MANUFACTURING SAMPLE TO BE PROVIDED FOR METHOD FOR OBSERVING SURFACE CHARACTERISTIC, AND SAMPLE TO BE PROVIDED FOR METHOD FOR OBSERVING SURFACE CHARACTERISTIC

摘要

PROBLEM TO BE SOLVED: To provide a technology for observing a surface flaw of an nm order.

SOLUTION: A method for observing surface characteristics of a substrate is equipped with: a deposition step of providing a film to be constituted of materials having a work function different from the one of materials constituting the surface of the substrate on the surface of the substrate; a film removal step of removing the film provided on the surface of the substrate so that components of the film in which a recess existing on the surface of the substrate provided in the deposition step is filled remains; and an observation step of observing the surface of the substrate after the film removal step with an electron microscope.

COPYRIGHT: (C)2012,JPO&INPIT