发明名称 |
SEMICONDUCTOR DEVICES AND FABRICATION METHODS |
摘要 |
<p>A method of making a semiconductor device comprises : providing a semiconductor wafer having a semiconductor layer; forming a first mask layer over the semiconductor layer; forming a second mask layer over the first mask layer; annealing the second mask layer to form islands; etching through the first mask layer and the semiconductor layer using the islands as a mask to form an array of pillars; and growing semiconductor material between the pillars and then over the tops of the pillars.</p> |
申请公布号 |
WO2012117247(A1) |
申请公布日期 |
2012.09.07 |
申请号 |
WO2012GB50458 |
申请日期 |
2012.02.29 |
申请人 |
SEREN PHOTONICS LIMITED;WANG, TAO |
发明人 |
WANG, TAO |
分类号 |
H01L33/00;H01L21/02 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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