| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology for smoothly performing the alignment between a shot region and a die, and an etching process after imprint process as well. <P>SOLUTION: An imprint device includes a central region 11 having a pattern and a pair of first peripheral regions 15, on the surface of a substrate side. The central region contains a border including a pair of sides parallel to an x-axis and a pair of sides parallel to a y-axis. The pair of first peripheral regions include a pair of sides parallel to the y-axis in the central region, and is arranged outside the central region. The first peripheral region includes a first region 15a in which a die side mark 7 is formed, and no resin is packed between the die and a substrate side mark 6 formed on the substrate during an imprint process, and a second region 15b in which no die side mark is formed, and a resin is packed between the die and the substrate side mark formed on the substrate during the imprint process. The second region contains a region that is in line symmetry with the first region, about a straight line which penetrates the center of the central region and is parallel to the y-axis. <P>COPYRIGHT: (C)2012,JPO&INPIT |
