Magnetron sputtering device comprises a hollow target and a magnet assembly arranged in the target, where the target and the magnet assembly are held in a holding unit and the magnet assembly is secured at a mechanism

摘要

The magnetron sputtering device comprises a hollow target (1) and a magnet assembly (2) arranged in the target, where the target and the magnet assembly are held in a holding unit (3). The magnet assembly is secured at a mechanism (4) that causes the movement of the magnet assembly in the longitudinal direction of the target, where the movement is half as large as the change in length of the target. The mechanism comprises a first supporting element and a second supporting element, where the first supporting element extends from a first end of the target to the middle area of the target. The magnetron sputtering device comprises a hollow target (1) and a magnet assembly (2) arranged in the target, where the target and the magnet assembly are held in a holding unit (3). The magnet assembly is secured at a mechanism (4) that causes the movement of the magnet assembly in the longitudinal direction of the target, where the movement is half as large as the change in length of the target. The mechanism comprises a first supporting element and a second supporting element, where the first supporting element extends from a first end of the target to the middle area of the target. The second supporting element extends from a second end of the target to the middle area of the target. The first and second supporting elements are connected in the middle area of the target by a proportional link that is connected to the magnet assembly. The proportional link is a twin lever or a gear wheel, which is rotatably attached at the magnet assembly and engages in linear gearings of the first and second supporting elements. One end of the twin lever is connected with the first supporting element and an other end is rotatably connected with the second supporting element. The magnet assembly is connected with the first and/or second supporting elements by a linear guide. The first and/or second supporting elements is more displaceable by an adjustment device relative to the target. The adjustment device comprises a threaded pin and a nut arranged on the device, where a rotation of the nut is produced by a displacement of the first supporting element and/or the second supporting element relative to the target.