METHOD OF CONTROLING SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A method for controlling a substrate processing device is provided to automatically calculate a voltage value corresponding to a target amount of discharged liquid crystals, thereby efficiently controlling the amount of discharged liquid crystals. CONSTITUTION: A change value of the amount of discharged liquid crystals is measured according to various voltage change values. Correlation data are generated(S110). Linear regression analysis of the correlation data is performed. A correlation equation of the amount of discharged liquid crystals is obtained about the voltage value(S120). A necessary voltage value about a target amount of discharged liquid crystals is calculated by the correlation equation(S130).