BASE-GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, MATERIAL FOR PATTERN-FORMING COMPRISING SAID PHOTOSENSITIVE RESIN COMPOSITION, PATTERN-FORMING METHOD USING SAID PHOTOSENSITIVE RESIN COMPOSITION, AND ARTICLE

摘要

The present invention is to provide a photosensitive resin composition which has excellent resolution, is low in cost and is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The present invention is also to provide a base generator which is applicable to such a photosensitive resin composition. Disclosed is a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating. Also disclosed is a photosensitive resin composition which comprises the base generator and a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance.