发明名称 PROCESSING METHOD OF SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a processing method of a substrate which enables a surface supporting the substrate to be processed. <P>SOLUTION: A processing method of a substrate includes: a first adhesion process in which a ring shaped first supporting member 1 which is formed along an outer periphery of a substrate 2 is adhered to a first surface of the substrate 2; a first processing process in which the substrate 2 is processed; and a first separation process in which the first supporting member 1 is separated from the substrate 2. Further, the first support member 1 has light transmissivity, and the first supporting member 1 is adhered to the substrate 2 with an adhesive or an adhesive tape which can be peeled off by UV light or high temperature heating. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012156292(A) 申请公布日期 2012.08.16
申请号 JP20110013751 申请日期 2011.01.26
申请人 SEIKO EPSON CORP 发明人 JIROMARU TOYO;TAKEUCHI JUNICHI
分类号 H01L21/301 主分类号 H01L21/301
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