发明名称 Systems and Methods for a Thin Film Capacitor Having a Composite High-K Thin Film Stack
摘要 Systems and methods are provided for fabricating a thin film capacitor involving depositing an electrode layer of conductive material on top of a substrate material, depositing a first layer of ferroelectric material on top of the substrat e material using a metal organic deposition or chemical solution deposition process, depositing a second layer of ferroelectric material on top of the first layer using a high temperature sputter process and depositing a metal interconnect layer to provide electric connections to layers of the capacitor.
申请公布号 US2012194966(A1) 申请公布日期 2012.08.02
申请号 US201213435392 申请日期 2012.03.30
申请人 ZELNER MARINA;CAPANU MIRCEA;NAGY SUSAN C.;PARATEK MICROWAVE, INC. 发明人 ZELNER MARINA;CAPANU MIRCEA;NAGY SUSAN C.
分类号 H01G4/33;B05D5/12 主分类号 H01G4/33
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