发明名称 |
Systems and Methods for a Thin Film Capacitor Having a Composite High-K Thin Film Stack |
摘要 |
Systems and methods are provided for fabricating a thin film capacitor involving depositing an electrode layer of conductive material on top of a substrate material, depositing a first layer of ferroelectric material on top of the substrat e material using a metal organic deposition or chemical solution deposition process, depositing a second layer of ferroelectric material on top of the first layer using a high temperature sputter process and depositing a metal interconnect layer to provide electric connections to layers of the capacitor. |
申请公布号 |
US2012194966(A1) |
申请公布日期 |
2012.08.02 |
申请号 |
US201213435392 |
申请日期 |
2012.03.30 |
申请人 |
ZELNER MARINA;CAPANU MIRCEA;NAGY SUSAN C.;PARATEK MICROWAVE, INC. |
发明人 |
ZELNER MARINA;CAPANU MIRCEA;NAGY SUSAN C. |
分类号 |
H01G4/33;B05D5/12 |
主分类号 |
H01G4/33 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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