| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a solar cell by utilizing an induction coupled plasma enhanced chemical vapor deposition. <P>SOLUTION: The method of manufacturing a solar cell 160 including a first electrode, a first type layer, an intrinsic layer, a second type layer and a second electrode includes an intrinsic layer formation step for forming the intrinsic layer consisting of a hydride amorphous silicon thin film by utilizing an induction coupled plasma enhanced chemical vapor deposition system using hydrogen (H<SB POS="POST">2</SB>) gas and silane (SiH<SB POS="POST">4</SB>) gas, where the ratio of silane gas to the hydrogen gas (H<SB POS="POST">2</SB>/SiH<SB POS="POST">4</SB>ratio) of the mixed gas is 8-10. <P>COPYRIGHT: (C)2012,JPO&INPIT |
