发明名称 SUBSTRATE COOLING DEVICE, SPUTTERING APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
摘要 A substrate cooling device includes: a substrate holding stage including a recess defining a space between a substrate mounting unit and a substrate mounted on the substrate mounting unit; a holding member that exerts a pressing force against the substrate holding stage so as to fix the substrate to the substrate holding stage; a refrigerator connected to the substrate holding stage; a coolant gas inlet path including a coolant gas inlet opening that is provided at the substrate holding stage and opens to a recessed face of the recess, the coolant gas inlet path connecting a space in the recess via the coolant gas inlet opening to a coolant gas supply; and a coolant gas outlet path including a coolant gas outlet opening that is provided at the substrate holding stage independently of the coolant gas inlet opening and opens to the recessed face of the recess.
申请公布号 US2012193216(A1) 申请公布日期 2012.08.02
申请号 US201213439397 申请日期 2012.04.04
申请人 CANON ANELVA CORPORATION 发明人 ENDO TETSUYA;ABARRA EINSTEIN NOEL
分类号 C23C14/34;F25B9/14;F25D17/04 主分类号 C23C14/34
代理机构 代理人
主权项
地址