发明名称 Methods, Systems and Polymer Substances Relating to Consideration of H2O Levels Present Within an Atmospheric-Pressure Nitrogen Dielectric-Barrier Discharge
摘要 <p>Methods and systems utilize an atmospheric-pressure nitrogen dielectric-barrier discharge to treat the surface of polymer substances. The atmospheric-pressure nitrogen dielectric-discharge may be maintained with a level of H<SUB>2</SUB>O below a pre-defined amount, such as by measuring and controlling the H<SUB>2</SUB>O within a treater, to produce a surface treatment for a polymer substance that yields desirable characteristics. Furthermore, the H<SUB>2</SUB>O level may be measured and controlled according to a pre-defined amount or according to another parameter such as an analysis of the resulting polymer surface. For example, the polymer surface may be provided with an optimal added nitrogen-to-added oxygen ratio and/or an optimal stability based on washed and unwashed advancing contact angles such as by controlling the H<SUB>2</SUB>O level within the treater based on these analyses of the treated polymer.</p>
申请公布号 KR101170576(B1) 申请公布日期 2012.08.01
申请号 KR20077002451 申请日期 2005.06.30
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分类号 C08J7/12;B29C59/12;C08J3/28;C23C16/00 主分类号 C08J7/12
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