| 发明名称 |
VACUUM PROCESSING APPARATUS |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus that is compact and has a small installation area. <P>SOLUTION: A vacuum processing apparatus comprises: a conveyance unit 105 disposed in a center of the vacuum processing apparatus; a processing bench disposed in a processing chamber; and a plurality of processing chambers 103, 103', 104 and 104' in which an object to be processed is put on the processing bench and the object to be processed is processed using gas. Flow rate adjustment units 107 and 107' for supplying the gas are disposed on a position between the processing chambers 103 and 104 and also between the processing chambers 103' and 104', respectively. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012142612(A) |
申请公布日期 |
2012.07.26 |
| 申请号 |
JP20120086184 |
申请日期 |
2012.04.05 |
| 申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MAKINO AKITAKA;TAKAHASHI YOJI;SORAOKA MINORU;KIHARA HIDEKI;TAUCHI TSUTOMU;OHIRAHARA YUZO |
| 分类号 |
H01L21/3065;H01L21/02;H01L21/205 |
主分类号 |
H01L21/3065 |
| 代理机构 |
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