| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoelectric element and a method of manufacturing the same. <P>SOLUTION: A photoelectric element has: a substrate having a surface and containing a normal direction vertical to the surface; plural first type crystal poles that are located on the surface of the substrate in contact with the surface so as to expose a part of the surface of the substrate; a first protection layer that is located on the side walls of the first type crystal poles and the exposed surface of the substrate; a first buffer layer that is located on the plural first type crystal poles and has a first surface coming into direct contact with the plural first type crystal poles and a second surface confronting the first surface; and at least one first hollow structure located among the plural first type crystal poles, the surface of the substrate and the first surface of the first buffer layer. At least one first hollow structure has a width and a height, the width is the maximum dimension in a direction parallel to the surface in the first hollow structure, the height is the maximum dimension in a direction parallel to the normal direction in the first hollow structure, and the ratio of the height to the width ranges from 1/5 to 3. <P>COPYRIGHT: (C)2012,JPO&INPIT |
