| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition device capable of forming continuously and efficiently a uniform thin film with a thickness uniform along a width direction of a base material, on a surface of the tape-like base material. <P>SOLUTION: The vapor deposition device includes a vapor deposition source 1 provided in an inside of a vacuum deposition chamber 11, a tape-like base material supply means (3) for supplying the tape-like base material 10 for vapor deposition, an ejection outlet 1a for ejecting a vapor deposition material evaporated from the vapor deposition source 1 toward a face to be vapor-deposited of the tape-like base material 10, a base material take-up means (4) for recovering the tape-like base material 10 after vapor-deposited, and a base material supporting means (5) for holding a vapor deposition position of the tape-like base material 10 in a prescribed distance with respect to the ejection outlet 1a of the vapor deposition source 1, and a shielding mask 2 of prescribed shape is attached replaceably to control a deposition amount of a vapor deposition material to the tape-like base material 10, in the ejection outlet 1a of the vapor deposition source 1. <P>COPYRIGHT: (C)2012,JPO&INPIT |
