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发明名称
METHOD FOR REWORKING A SILICON-CONTAINING ARC LAYER ON A SUBSTRATE
摘要
申请公布号
KR20120082432(A)
申请公布日期
2012.07.23
申请号
KR20127011054
申请日期
2010.09.27
申请人
TOKYO ELECTRON LIMITED
发明人
FITRIANTO
分类号
H01L21/3205;H01L21/306
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
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