发明名称 SECONDARY ELECTRON DETECTOR AND CHARGE PARTICLE BEAM APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To prevent discharge with a simple structure and obtain excellent images with high detection efficiency. <P>SOLUTION: A scintillator 21 is arranged on an incident side surface 23a of a photomultiplier 23, and a scintillator cap 22 pulling electrons in the scintillator 21 is arranged around the scintillator 21. The photomultiplier 23 in which a vacuum seal is provided around it, is placed in a sample chamber. An insulating member 25 consisting of an opaque material is placed between the scintillator cap 22 and the photomultiplier 23, the insulating member 25 insulates the scintillator cap 22 from the photomultiplier 23 and covers a side peripheral portion 23b of the photomultiplier 23 to prevent an incidence of light to the photomultiplier 23. A band filter 27 for intercepting illumination light from an optical microscope is placed between the scintillator 21 and the incident side surface 23a of the photomultiplier 23, thereby it is possible to perform simultaneous observation with the optical microscope. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012138324(A) 申请公布日期 2012.07.19
申请号 JP20100291579 申请日期 2010.12.28
申请人 TOPCON CORP 发明人 TATENO HIROSHI
分类号 H01J37/244;H01J37/18;H01J37/22;H01J37/28 主分类号 H01J37/244
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