发明名称 |
SILICON PURIFICATION METHOD AND SILICON PURIFICATION DEVICE |
摘要 |
The silicon purification method uses a silicon purification device including at least a crucible for loading a silicon metal and a plasma torch, and purifies the silicon metal by injecting a plasma gas from the plasma torch toward a melt surface of the silicon metal loaded in the crucible in a state where an angle formed by the melt surface and the plasma gas is set in the range of 20� to 80�. |
申请公布号 |
US2012181164(A1) |
申请公布日期 |
2012.07.19 |
申请号 |
US201013395895 |
申请日期 |
2010.09.17 |
申请人 |
OOKUBO YASUO;NAGATA HIROSHI;ULVAC, INC. |
发明人 |
OOKUBO YASUO;NAGATA HIROSHI |
分类号 |
C01B33/037;B01J19/08 |
主分类号 |
C01B33/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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