发明名称 |
Interspinous process implants and methods of use |
摘要 |
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant. |
申请公布号 |
US8221463(B2) |
申请公布日期 |
2012.07.17 |
申请号 |
US20070806526 |
申请日期 |
2007.05.31 |
申请人 |
ZUCHERMAN JAMES F.;HSU KEN Y.;KLYCE HENRY A.;WINSLOW CHARLES J.;YERBY SCOTT A.;FLYNN JOHN J.;MITCHELL STEVEN T.;MARKWART JOHN A.;KYPHON SARL |
发明人 |
ZUCHERMAN JAMES F.;HSU KEN Y.;KLYCE HENRY A.;WINSLOW CHARLES J.;YERBY SCOTT A.;FLYNN JOHN J.;MITCHELL STEVEN T.;MARKWART JOHN A. |
分类号 |
A61B17/70 |
主分类号 |
A61B17/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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