发明名称 |
Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound |
摘要 |
A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
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申请公布号 |
US8221956(B2) |
申请公布日期 |
2012.07.17 |
申请号 |
US20090457705 |
申请日期 |
2009.06.18 |
申请人 |
SHIONO DAIJU;HIRANO TOMOYUKI;FURUYA SANAE;DAZAI TAKAHIRO;SHIMIZU HIROAKI;KUROSAWA TSUYOSHI;NITO HIDETO;NAKAMURA TSUYOSHI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
SHIONO DAIJU;HIRANO TOMOYUKI;FURUYA SANAE;DAZAI TAKAHIRO;SHIMIZU HIROAKI;KUROSAWA TSUYOSHI;NITO HIDETO;NAKAMURA TSUYOSHI |
分类号 |
G03F7/039;C08F14/18;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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