| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lighting system capable of alleviating illuminance unevenness on an irradiation face of extracted light. <P>SOLUTION: The lighting system 1 is provided with a mounting substrate 2 with its main face 2a curved in convex in cross-section view, a plurality of light-emitting devices 3 fitted on a surface of the main face, and a reflector 4 surrounding each of the plurality of light-emitting devices 3 fitted on the main face 2a and consisting of a pair of reflecting members 11 in cross-section view. As to the reflector 4 surrounding the light-emitting devices 3 positioned at a site not facing a virtual plane S facing a front face of one of the plurality of light-emitting devices 3, a reflecting member 11 positioned near the light-emitting device 3 facing the virtual plane S has a shorter length from the main face 2a to the front end than the reflecting member 11 positioned further away from the light-emitting device 3 facing the virtual plane S. <P>COPYRIGHT: (C)2012,JPO&INPIT |
