| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of grasping a state of a liquid immersion area of liquid. <P>SOLUTION: An exposure apparatus EX is equipped with a projection optical system PL, and the projection optical system PL has a first optical element LS1 nearest to an image plane of the projection optical system PL. Then, the exposure apparatus EX is equipped with a first liquid immersion mechanism 1, which forms a first liquid immersion region LR1 of first liquid LQ1, between an upper surface 65 of a transparent member 64 provided on an image plane side of the projection optical system PL and the first optical element LS1; and an observation device 60 for observing a state of the first liquid immersion region LR1. <P>COPYRIGHT: (C)2012,JPO&INPIT |
